Misorientation dependence grain boundary complexions in <111> symmetric tilt Al grain boundaries


Por: Parajuli, Prakash, Romeu, David, Hounkpati, Viwanou, Mendoza-Cruz, Ruben, Chen, Jun, Yacaman, Miguel Jose, Flowers, Jacob, Ponce, Arturo

Publicada: 1 ene 2019
Resumen:
Since polycrystalline alloys consist of a complex network of various types of grain boundaries (GBs), detailed atomic-scale analysis of how some impurities are distributed at every type of GBs is necessary to fully understand the implications of GB segregation on material's performance. In this study, we present the atomic-scale structural combined with a chemical analysis of segregation induced GB complexions across the various types of Al alloy 7075 GBs using aberration-corrected microscopy and crystal orientation mapping assisted with precession electron diffraction. The result shows multilayer Cu GB segregation containing non-uniformly segregated mixed atomic columns across the interfaces. Two distinct types of Cu GB segregation behavior were observed, point and parallel array, analyzed by means of a displacement field obtained from the dichromatic pattern. Atomistic simulations were performed to test the energetic feasibility of the observed segregation behavior. As per the knowledge of the authors, this is the first report on experimental analysis of segregation induced periodic ordered structured GB complexions on Al alloy system. Furthermore, every GBs of the films were segregated uniquely forming ordered structures along the interface. The distance between two consecutive high segregated units was periodic for the point segregated GBs and followed a trend of a theoretical model of dislocation spacing. Based on the distance between two high segregated units, it is inferred that highly misorientated GBs are more segregated than low misoriented GBs. This study demonstrates that the misorientation between the neighboring grains significantly influences the segregation behavior across the interface and consequently, the structure of segregation-induced GB complexions. © 2019 Acta Materialia Inc.

Filiaciones:
Parajuli, Prakash:
 Department of Physics and Astronomy, The University of Texas at San Antonio, One UTSA Circle, San Antonio, TX 78249, United States

 Univ Texas San Antonio, Dept Phys & Astron, One UTSA Circle, San Antonio, TX 78249 USA

Romeu, David:
 Instituto de Física, Universidad Nacional Autónoma de México, Apartado Postal 20-364, Mexico City, 01000, Mexico

 Univ Nacl Autonoma Mexico, Inst Fis, Apartado Postal 20-364, Mexico City 01000, DF, Mexico

Hounkpati, Viwanou:
 Normandie Univ, ENSICAEN, UNICAEN, CEA, CNRS, CIMAP, Caen, 14000, France

 Normandie Univ, ENSICAEN, UNICAEN, CEA,CNRS,CIMAP, F-14000 Caen, France

Mendoza-Cruz, Ruben:
 Department of Physics and Astronomy, The University of Texas at San Antonio, One UTSA Circle, San Antonio, TX 78249, United States

 Univ Texas San Antonio, Dept Phys & Astron, One UTSA Circle, San Antonio, TX 78249 USA

Chen, Jun:
 Normandie Univ, ENSICAEN, UNICAEN, CEA, CNRS, CIMAP, Caen, 14000, France

 Normandie Univ, ENSICAEN, UNICAEN, CEA,CNRS,CIMAP, F-14000 Caen, France

Yacaman, Miguel Jose:
 Department of Physics and Astronomy, The University of Texas at San Antonio, One UTSA Circle, San Antonio, TX 78249, United States

 Univ Texas San Antonio, Dept Phys & Astron, One UTSA Circle, San Antonio, TX 78249 USA

Flowers, Jacob:
 Department of Physics and Astronomy, The University of Texas at San Antonio, One UTSA Circle, San Antonio, TX 78249, United States

 Univ Texas San Antonio, Dept Phys & Astron, One UTSA Circle, San Antonio, TX 78249 USA

Ponce, Arturo:
 Department of Physics and Astronomy, The University of Texas at San Antonio, One UTSA Circle, San Antonio, TX 78249, United States

 Univ Texas San Antonio, Dept Phys & Astron, One UTSA Circle, San Antonio, TX 78249 USA
ISSN: 13596454
Editorial
Elsevier Science Ltd, Exeter, United Kingdom, THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, ENGLAND, Estados Unidos America
Tipo de documento: Article
Volumen: 181 Número:
Páginas: 216-227
WOS Id: 000498749300019

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