Influence of oxygen pressure on the fs laserinduced oxidation of molybdenum thin films
Por:
Cuando-Espitia N., Redenius J., Mensink K., Camacho-López M., Camacho-López S., Aguilar G.
Publicada:
1 ene 2018
Categoría:
Electronic, optical and magnetic materials
Resumen:
We present a study of femtosecond (1028 nm, 230 fs, 54.7 MHz) laser processing on molybdenum (Mo) thin films. Irradiations were done under ambient air as well as pure oxygen (O2) at various gauge pressures (4, 8, 12 and 16 psi). Our results indicate that the high heating rates associated with laser processing allow the production of different molybdenum oxides. Raman spectroscopy and scanning electron microscopy are used to characterize the molybdenum oxidation for the different irradiation and oxygen pressures parameters chosen showing a high correlation between well-defined oxidation zones and the oxygen pressure surrounding the samples during the irradiation of the Mo thin films. © 2018, Optical Society of America.
Filiaciones:
Cuando-Espitia N.:
Department of Mechanical Engineering, University of California Riverside, Riverside, CA, United States
Redenius J.:
Department of Mechanical Engineering, University of California Riverside, Riverside, CA, United States
Mensink K.:
Department of Mechanical Engineering, University of California Riverside, Riverside, CA, United States
Camacho-López M.:
Laboratorio de Investigación y Desarrollo de Materiales Avanzados, Facultad de Química, Universidad Autónoma del Estado de México, Campus Rosedal, Km 14.5 Carretera Toluca-Atlacomulco, San Cayetano de Morelos, Toluca, Mexico
Camacho-López S.:
Departamento de óptica, Centro de Investigación Científica y de Educación Superior de Ensenada, Carretera Ensenada-Tijuana 3918, Zona Playitas, Ensenada, Baja California, Mexico
Aguilar G.:
Department of Mechanical Engineering, University of California Riverside, Riverside, CA, United States
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