Study of the integrated fluence threshold condition for the formation of ß-Bi2O3 on Bi thin films by using ns laser pulses


Por: Venegas-Castro, A., Reyes-Contreras, A., Camacho-Lopez, M., Olea-Mejia, O., Camacho-Lopez, S., Esparza-Garcia, A.

Publicada: 1 jul 2016
Resumen:
The formation of ß-Bi2O3 through laser irradiation of a bismuth (Bi) thin film is reported. The bismuth thin films were irradiated in atmospheric air using Nd:YAG laser pulses of 7 ns duration and 1064 nm wavelength. A set of irradiations was done on the samples varying the total irradiation time (i. e. the number of pulses) for a fix per pulse laser fluence of 25 mJ/cm2. The laser processed regions were characterized by optical microscopy (OM), scanning electron microscopy (SEM) and microRaman spectroscopy (mRS). OM results show that the laser modified cross section on the film is smaller than the laser beam cross section, which means a thermally confined interaction; SEM micrographs reveled the formation of submicron sized particles as a result of the multi-pulse laser irradiation; using microRaman spectroscopy characterization we were able to determine the formation of the ß-Bi2O3 crystalline phase within the laser irradiated spot on the sample. © 2016 Elsevier Ltd. All rights reserved.

Filiaciones:
Venegas-Castro, A.:
 Univ Autonoma Estado Mexico, Fac Quim, Posgrad Ciencia Mat, Toluca 50110, Mexico

Reyes-Contreras, A.:
 Univ Autonoma Estado Mexico, Fac Quim, Lab Invest & Desarrollo Mat Avanzados, Campus Rosedal,Km 14-5, San Cayetano De Morelos 50200, Mexico

Camacho-Lopez, M.:
 Univ Autonoma Estado Mexico, Fac Quim, Lab Invest & Desarrollo Mat Avanzados, Campus Rosedal,Km 14-5, San Cayetano De Morelos 50200, Mexico

Olea-Mejia, O.:
 Univ Autonoma Estado Mexico, Ctr Conjunto Invest Quim Sustentable UAEM UNAM, Km 14-5 Carretera Toluca Atlacomulco, San Cayetano 50200, Mexico

Camacho-Lopez, S.:
 Ctr Invest Cient & Educ Super Ensenada, Dept Opt, Carretera Ensenada Tijuana 3918, Mexico City 22860, Baja California, Mexico

Esparza-Garcia, A.:
 Univ Nacl Autonoma Mexico, CCADET, Dept Tecnociencias, Fotofis & Peliculas Delgadas, Circuito Exterior S-N, Mexico City 04510, DF, Mexico
ISSN: 00303992
Editorial
Elsevier Ltd, THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, OXON, ENGLAND, Reino Unido
Tipo de documento: Article
Volumen: 81 Número:
Páginas: 50-54
WOS Id: 000373546900009

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