Evaluation of the photodiscoloration efficiency of beta-Bi2O3 films deposited on different substrates by pneumatic spray pyrolysis


Por: Gadhi T.A., Gómez-Velázquez L.S., Bizarro M., Hernández-Gordillo A., Tagliaferro A., Rodil S.E.

Publicada: 30 sep 2017
Resumen:
Immobilization of beta-beta i(2)O(3) over corning glass and sintered silica discs was performed to evaluate a competing fixed support as an alternative to slurry based photocatalytic systems. Pneumatic spray pyrolysis technique was used to produce coatings of beta-beta i(2)O(3) at 450 degrees C. Coated substrates were characterized using X-ray diffraction (XRD) and UV-Vis diffused reflectance spectroscopy (DRS), field emission scanning electron microscope (FESEM) and energy dispersive X-ray spectrometry (EDS). The XRD analysis showed that the obtained crystalline structure of the films is tetragonal beta-beta i(2)O(3) for both glass and silica. DRS showed the broad absorbance spectra of the films, correlated to beta-beta i(2)O(3) with an energy band gap of 2.4 eV. FESEM showed that the morphology of the films was different according to the substrate. In the case of corning glass, random non-compact distribution of particles was observed while over silica discs overlapped sheets of beta-beta i(2)O(3) were seen. This is probably due to differences in the wetting and evaporation rate of the sprayed droplets. During photodiscoloration of anionic indigo carmine (IC) dye solution, the beta-beta i(2)O(3) coated silica was found more effective than the coated glass, response associated to the larger interaction between the dye molecules and catalysts assisted by the roughness and porosity induced by the silica. Furthermore, photocatalytic evaluation of coated silica in discoloration of other two organic dyes: cationic rhodamine B (RhB) and anionic acid blue 113 (AB) revealed that adsorption and interaction of the dye molecules with coated films could vary due to the presence of different functional and branched groups that overall affect the photocatalytic process, the kinetic rate of discoloration and the TOC analysis. Finally, after the assessment of stability of films and suitability of silica, it was confirmed that silica discs are favorable as a photocatalyst support and last long usage for photodiscoloration of organic dyes. (C) 2017 Elsevier B.V. All rights reserved.

Filiaciones:
Gadhi T.A.:
 Politecn Torino, Dept Appl Sci & Technol, Turin, Italy

 Department of Applied Science and Technology, Politecnico di Torino, Italy

Gómez-Velázquez L.S.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Circuito Exterior SN,Ciudad Univ, Mexico City 04510, DF, Mexico

 Univ Nacl Autonoma Mexico, Posgrad Ciencia & Ingn Mat, Mexico City, DF, Mexico

 Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Circuito Exterior SN, Ciudad Universitaria, CP 04510, Coyoacán, Cd. De México, Mexico

 Posgrado en Ciencia e Ingeniería de Materiales, Universidad Nacional Autónoma de México, Mexico

Bizarro M.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Circuito Exterior SN,Ciudad Univ, Mexico City 04510, DF, Mexico

 Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Circuito Exterior SN, Ciudad Universitaria, CP 04510, Coyoacán, Cd. De México, Mexico

Hernández-Gordillo A.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Circuito Exterior SN,Ciudad Univ, Mexico City 04510, DF, Mexico

 Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Circuito Exterior SN, Ciudad Universitaria, CP 04510, Coyoacán, Cd. De México, Mexico

Tagliaferro A.:
 Politecn Torino, Dept Appl Sci & Technol, Turin, Italy

 Department of Applied Science and Technology, Politecnico di Torino, Italy

Rodil S.E.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Circuito Exterior SN,Ciudad Univ, Mexico City 04510, DF, Mexico

 Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Circuito Exterior SN, Ciudad Universitaria, CP 04510, Coyoacán, Cd. De México, Mexico
ISSN: 00406090
Editorial
ELSEVIER SCIENCE SA, PO BOX 564, 1001 LAUSANNE, SWITZERLAND, Suiza
Tipo de documento: Article
Volumen: 638 Número:
Páginas: 119-126
WOS Id: 000411775900016

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