Metal nitride coatings deposited by UBM: Efficient and environmentally clean technology [Recubrimientos de nitruros metálicos depositados con UBM: Tecnología eficiente y ambientalmente limpia]
Por:
Olaya J., Marulanda D., Rodil S.
Publicada:
1 ene 2010
Categoría:
Engineering (miscellaneous)
Resumen:
The aim of this research is to study the influence of the magnetic field configuration on the plasma parameters and other TaN, TiN, NbN, ZrN and CrN coating properties produced by the Unbalanced Magnetron Sputtering system (UBM). This system allows modifying de ionic current density and the energy of the ions that arrive at the substrate, through the variation in the magnetic field configuration without modifying other deposition conditions. The different configurations of the magnetic field were quantified through the unbalance coefficient, KG, which is proportional to the position in the magnetron zero field. The most important effect of the increase of the ionic bombarding when varying the magnetic field configuration was observed on film microstructure, particularly on preferred orientation. [200] preferred orientation was observed in all coatings when using KG = 1.3 configuration. However, for KG = 0.85 the answer was different for each material. Another consequence of increasing ionic bombarding was the compressive residual stress increase which resulted higher for TaN films as CrN films presented the lower stress concentration. Higher hardness was observed for TaN, NbN and ZrN films, ZrN films had higher corrosion resistance, and NbN films presented higher wear resistance.
Filiaciones:
Olaya J.:
Departamento de Ingeniería Mecánica y Mecatrónica, Universidad Nacional de Colombia, Colombia
Marulanda D.:
Departamento de Ingeniería Mecánica y Mecatrónica, Universidad Nacional de Colombia, Colombia
Rodil S.:
Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Colombia
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