An alternative procedure for the determination of the optical band gap and thickness of amorphous carbon nitride thin films


Por: Escobar-Alarcón L., Arrieta A., Camps E., Muhl S., Rodil S., Vigueras-Santiago E.

Publicada: 1 ene 2007
Categoría: Surfaces, Coatings and Films

Resumen:
In this work, we propose an alternative procedure to obtain the optical band gap and the thickness of amorphous carbon nitride thin films that requires only the measurement of the absorbance spectrum of the samples. The method is based on an absorbance spectrum fitting (ASF) procedure using the Tauc model, which is widely applied to the study of amorphous semiconductors. With the aim of evaluating the proposed method two sets of carbon nitride samples deposited on glass substrates were analyzed; one prepared by pulsed laser ablation (PLA) and the second by magnetron sputtering. The obtained results using different conventional methods were compared with the results of the ASF method and a good agreement between the values and the tendencies with the experimental conditions used to prepare the films were observed. © 2007 Elsevier B.V. All rights reserved.

Filiaciones:
Escobar-Alarcón L.:
 Departamento de Física, Instituto Nacional de Investigaciones Nucleares, Apdo. Postal 18-1027, México, DF 11801, Mexico

Arrieta A.:
 Departamento de Física, Instituto Nacional de Investigaciones Nucleares, Apdo. Postal 18-1027, México, DF 11801, Mexico

 Departamento de Física, Univ. Autonoma Metropolitana Iztapalapa Apdo Postal 55-534, México, DF 09340, Mexico

Camps E.:
 Departamento de Física, Instituto Nacional de Investigaciones Nucleares, Apdo. Postal 18-1027, México, DF 11801, Mexico

Muhl S.:
 Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Apdo. Postal 364, México, DF 01000, Mexico

Rodil S.:
 Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Apdo. Postal 364, México, DF 01000, Mexico

Vigueras-Santiago E.:
 Facultad de Química, Universidad Autónoma del Estado de México, Paseo Colóny Tollocan, Toluca, 50110, Mexico
ISSN: 01694332
Editorial
ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS, Países Bajos
Tipo de documento: Article
Volumen: 254 Número: 1 SP
Páginas: 412-415
WOS Id: 000250800100093

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