Influence of the ion-atom flux ratio on the mechanical properties of chromium nitride thin films
Por:
Olaya J.J., Wei G., Rodil S.E., Muhl S., Bhushan B.
Publicada:
1 ene 2007
Resumen:
In this paper we report the mechanical properties of chromium nitride (CrN) thin films deposited at different levels of ion bombardment and their relationship with the microstructural parameters, such as grain size, preferred orientation and residual stress. The samples were deposited by unbalanced magnetron sputtering changing the substrate-target distance and the substrate bias, keeping other deposition condition fixed. The mechanical properties were obtained by nanoindentation performed on 1.8 ?m thick samples. Under the different deposition conditions all of the CrN films were approximately stoichiometric, but clear variations in the microstructure were seen. The hardness was nearly constant at 24-27 GPa even when the grain size, residual stress and crystalline orientation changed. However, the elastic modulus showed a steady increase from 300 to 350 GPa, proportional to the variations in grain size and the residual stress level. © 2006 Elsevier Ltd. All rights reserved.
Filiaciones:
Unidad de Materiales, Departamento de Ingeniería Mecánica y Mecatrónica, Universidad Nacional de Colombia, Carrera 30 Número 45-03, Bogotá, Colombia
Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Circuito exterior s/n, CU, 04510 México DF, Mexico
Nanotribology Laboratory for Information Storage, MEMS, NEMS, 206 West 18th Avenue, Columbus, OH 43210-1107, United States
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