Opto-electronic properties of bismuth oxide films presenting different crystallographic phases


Por: Gomez C.L., Depablos-Rivera O., Silva-Bermudez P., Muhl S., Zeinert A., Lejeune M., Charvet S., Barroy P., Camps E., Rodil S.E.

Publicada: 2 mar 2015
Resumen:
The optical, electrical and structural properties of bismuth oxide thin films deposited by radio frequency reactive magnetron sputtering were studied. The Bi2O3 thin films were grown on Si and glass substrates under different power and substrate temperatures in an oxygen-enriched plasma leading to films with different crystalline phase as evidenced by X-ray diffraction and Raman spectroscopy. The optical properties of the films were measured using ellipsometric spectroscopy and optical transmission spectra. In order to parameterize the optical dispersion functions (n, k) of the films, the Tauc-Lorentz dispersion model was used. The optical bandgap was then assessed by different methods and the results are compared to the thermal variations of the electrical resistivity of the films. It was found that the refractive index, extinction coefficient and optical gap strongly depend on the deposition conditions and the crystalline phase; the fluorite defect cubic d-Bi2O3 phase showed the lowest optical gap and lower resistivity. © 2015 Elsevier B.V. All rights reserved.

Filiaciones:
Gomez C.L.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

Depablos-Rivera O.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

Silva-Bermudez P.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

Muhl S.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

Zeinert A.:
 Laboratoire de Physique de la Matière Condensée, Université de Picardie Jules Verne, 33 rue Saint Leu, Amiens Cedex 1, 80039, France

Lejeune M.:
 Laboratoire de Physique de la Matière Condensée, Université de Picardie Jules Verne, 33 rue Saint Leu, Amiens Cedex 1, 80039, France

Charvet S.:
 Laboratoire de Physique de la Matière Condensée, Université de Picardie Jules Verne, 33 rue Saint Leu, Amiens Cedex 1, 80039, France

Barroy P.:
 Laboratoire de Physique de la Matière Condensée, Université de Picardie Jules Verne, 33 rue Saint Leu, Amiens Cedex 1, 80039, France

Camps E.:
 Instituto Nacional de Investigaciones Nucleares, Carretera Mexico-Toluca S/N, kilometro 36.5. La Marquesa, Municipio de Ocoyoacac, Estado de México, CP 52750, Mexico

Rodil S.E.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico
ISSN: 00406090
Editorial
ELSEVIER SCIENCE SA, PO BOX 564, 1001 LAUSANNE, SWITZERLAND, Suiza
Tipo de documento: Article
Volumen: 578 Número:
Páginas: 103-112
WOS Id: 000351686500016

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