Structure and morphology of films of pm-Si:H grown by PECVD varying dichlorosilane with hydrogen dilution and working pressure
Por:
Alvarez-Macias, C, Santoyo-Salazar, J, Monroy, BM, Garcia-Sanchez, MF, Picquart, M, Ponce, A, Contreras-Puente, G, Santana, G
Publicada:
1 jun 2011
Categoría:
Physics and Astronomy (miscellaneous)
Resumen:
Filiaciones:
Alvarez-Macias, C:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico
Santoyo-Salazar, J:
Inst Politecn Nacl, Ctr Invest & Estudios Avanzados, Dept Fis, Mexico City 07000, DF, Mexico
Monroy, BM:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico
Garcia-Sanchez, MF:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico
Univ Autonoma Metropolitana Iztapalapa, Dept Fis, Mexico City 09340, DF, Mexico
Ponce, A:
Univ Texas San Antonio, Dept Phys & Astron, Kleberg Adv Elect Microscopy Ctr, San Antonio, TX 78249 USA
Contreras-Puente, G:
Inst Politecn Nacl, UPALM, Escuela Super Fis & Matemat, Mexico City 07738, DF, Mexico
Santana, G:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico
Inst Politecn Nacl, UPALM, Escuela Super Fis & Matemat, Mexico City 07738, DF, Mexico
|