Amorphous niobium oxide thin films
Por:
Ramírez G., Rodil S.E., Muhl S., Turcio-Ortega D., Olaya J.J., Rivera M., Camps E., Escobar-Alarcón L.
Publicada:
1 nov 2010
Resumen:
Amorphous niobium oxide thin films were deposited by unbalanced reactive magnetron sputtering under different conditions of pressure (2 to 4 Pa) and oxygen percentage (9 17 and 23%) The films were characterized to obtain the relationships between the deposition parameters and the most relevant physical properties (structural optical mechanical surface morphology and optical) The composition was determined by Rutherford backscattering spectroscopy and energy dispersive X-ray spectroscopy From the results of X-ray diffraction and the composition we can conclude that for all of the deposition pressures and flow ratios used the films were stoichiometric Nb2O5 and amorphous Similarly the mechanical and optical properties did not show significant variation between the different deposition conditions all the films were transparent with a bandgap of about 3 4 eV and a hardness around 5 GPa Concerning the electrochemical properties the response of the films to DC polarization in a 089% NaCl sol
Filiaciones:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico
Univ Nacl Autonoma Mexico, Fac Quim, Dept Ingn Quim, Mexico City 04510, DF, Mexico
Univ Nacl Autonoma Mexico, Inst Fis, Dpto Materia Condensada, Mexico City 04510, DF, Mexico
Unidad de Materiales, Departamento de Ingeniería Mecánica y Mecatrónica, Universidad Nacional de Colombia, Cra. 30, 45-03, Bogotá, Colombia
Departamento de Física, Instituto Nacional de Investigaciones Nucleares, Apdo. Postal 18-1027, México D.F. 11801, Mexico
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