Visible electroluminescence from silicon nanoclusters embedded in chlorinated silicon nitride thin films
Por:
Alonso, JC, Pulgarin, FA, Monroy, BM, Benami, A, Bizarro, M, Ortiz, A
Publicada:
3 may 2010
Resumen:
Visible electroluminescence (EL) has been obtained from devices with active layers of silicon nanocrystals embedded in chlorinated silicon nitride (Si-nc/SiN(x):Cl) thin films, deposited by remote plasma enhanced chemical vapour deposition, using SiCl(4)/NH(3)/H(2)/Ar. The active nc-Si/SiN(x):Cl film was sandwiched between Al contacts and a transparent conductive contact of ZnO(x):Al deposited by the pyrosol process. White EL centred at around 600 nm was observed, with a turn-on voltage of 5 V, and the intensity increasing as a function of voltage. Recombination between electron-hole pairs generated in the Si-nc by electron impact ionization is proposed as the EL mechanism. (C) 2009 Elsevier B.V. All rights reserved.
Filiaciones:
Alonso, JC:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Coyoacan 04510, DF, Mexico
Pulgarin, FA:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Coyoacan 04510, DF, Mexico
Monroy, BM:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Coyoacan 04510, DF, Mexico
Benami, A:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Coyoacan 04510, DF, Mexico
Bizarro, M:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Coyoacan 04510, DF, Mexico
Ortiz, A:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Coyoacan 04510, DF, Mexico
|