Deposition of amorphous carbon-silver composites
Por:
Garcia-Zarco O., Rodil S.E., Camacho-López M.A.
Publicada:
31 dic 2009
Resumen:
Composites of amorphous carbon films and silver were deposited by co-sputtering, where the target (10 cm diameter) was of pure graphite with small inclusion of pure silver (less than 1 cm(2)). The films were deposited under different powers, from 40 to 250 W, and different target-substrate distances. The substrate was earthed and rotated in order to obtain a uniform distribution of the silver content. The addition of the Ag piece into the target increased the deposition rate of the carbon films, which could be related to the higher sputter yield of the silver, but there seems to be also a contribution from a larger emission of secondary electrons from the Ag that enhances the plasma and therefore the sputtering process becomes more efficient. Scanning electron micrographs acquired using backscattered electrons showed that the silver was segregated from the carbon matrix, forming nanoparticles or larger clusters as the power was increased. The X-ray diffraction pattern showed that the s
Filiaciones:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico
Facultad de Química, Universidad Autónoma Del Estado de México, Tollocan s/n, esq. Paseo Colón, Toluca, Estado de México 50110, Mexico
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