Study of Luminescence from GaN:Tb3+ Powders and Thin Films Deposited by MOVPE and PLD Methods


Por: Tao J.H., Laski J., Perea-Lopez N., Shimizu S., McKittrick J., Talbot J.B., Mishra K.C., Hamby D.W., Raukas M., Klinedinst K., Hirata G.

Publicada: 1 ene 2009
Resumen:
Due to the recent commercial interest in nitride-based optoelectronics and rare-earth emission in nitride materials, the structural and optical characteristics of GaN:Tb3+ powders and thin films have been investigated in this work. The powder samples were made using a three-step solution method. Pulsed laser deposition (PLD) and metallorganic vapor phase epitaxy (MOVPE) methods were utilized for depositing GaN:Tb3+ films on sapphire substrates. The GaN powders with activator concentrations up to 8 atom % exhibited Tb3+ luminescence due to the D-5(3,4)-> F-7(j) transitions under cathodoluminescence (CL) as well as under 243 nm photon excitation. Both near-band-edge emission and activator emission have been observed in PLD thin films made from the corresponding GaN:Tb3+ powders. X-ray diffraction revealed polycrystalline PLD thin films with a preferred growth direction along the c axis, while scanning electron micrographs showed rough film morphology with submicrometer particles. CL emis

Filiaciones:
Tao J.H.:
 Materials Science and Engineering Program, University of California, San Diego, San Diego, CA 92093, United States

Laski J.:
 OSRAM SYLVANIA, Central Research, Beverly, MA 01915, United States

Perea-Lopez N.:
 Materials Science and Engineering Program, University of California, San Diego, San Diego, CA 92093, United States

Shimizu S.:
 Department of Nanoengineering, University of California, San Diego, San Diego, CA 92093, United States

McKittrick J.:
 Materials Science and Engineering Program, University of California, San Diego, San Diego, CA 92093, United States

 Department of Mechanical and Aerospace Engineering, University of California, San Diego, San Diego, CA 92093, United States

Talbot J.B.:
 Materials Science and Engineering Program, University of California, San Diego, San Diego, CA 92093, United States

 Department of Nanoengineering, University of California, San Diego, San Diego, CA 92093, United States

Mishra K.C.:
 OSRAM SYLVANIA, Central Research, Beverly, MA 01915, United States

Hamby D.W.:
 OSRAM SYLVANIA, Central Research, Beverly, MA 01915, United States

Raukas M.:
 OSRAM SYLVANIA, Central Research, Beverly, MA 01915, United States

Klinedinst K.:
 OSRAM SYLVANIA, Central Research, Beverly, MA 01915, United States

Hirata G.:
 Univ Nacl Autonoma Mexico, Ctr Nanociencias & Nanotecnol, Ensenada 22800, Baja California, Mexico
ISSN: 00134651
Editorial
ELECTROCHEMICAL SOC INC, 65 SOUTH MAIN STREET, PENNINGTON, NJ 08534 USA, Estados Unidos America
Tipo de documento: Article
Volumen: 156 Número: 6
Páginas: 158-163
WOS Id: 000265737600066

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