Preferential orientation in metal nitride deposited by the UBM system
Por:
Olaya J.J., Marulanda D.M., Rodil S.
Publicada:
1 abr 2010
Categoría:
Engineering (miscellaneous)
Resumen:
This work was aimed at studying the influence of ion bombardment on the preferred orientation (OP) of transition metal nitrides (TMN) produced by the reactive sputtering technique with a variable unbalanced magnetron through permanent magnets. Titanium nitride (TiN) coatings were thus studied by varying two parameters: ion-atom ratio on the substrate (J(i)/J(a)) and nitrogen flux. Deposition conditions were as follows: 7 mTorr working pressure, similar to 380 degrees C substrate temperature, 2 and 8.5 sccm nitrogen flux and 245-265 discharge power. The results showed that preferred orientation (111) and the crystalline behaviour of the produced coatings depended more on nitrogen flux than on ion bombardment. Similarly, micro-hardness measured on films deposited on steel AISI-M2 substrates increased from 1600 to 2000 HV0.025 when nitrogen flux was increased.
Filiaciones:
Olaya J.J.:
Universidad Nacional Autónoma de México, Mexico
Departamento de Ingeniería Mecánica y Mecatrónica, Universidad Nacional de Colombia, Bogotá, Colombia
Marulanda D.M.:
Departamento de Ingeniería Mecánica y Mecatrónica, Universidad Nacional de Colombia, Bogotá, Colombia
Universidad Nacional de Colombia, Colombia
Rodil S.:
Univ Autonoma Mexico, Inst Invest Mat, Mexico City, DF, Mexico
Universidad Nacional Autónoma de México, Mexico
University of Cambridge, Reino Unido, United Kingdom
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