Nanosilicon Crystallite Embedded into Amorphous Silicon Matrix: Polymorphous Silicon thin film, obtained by Plasma Enhanced Chemical Vapor Deposition

Por: Remolina A., Santana G., Ponce A., Monroy B.M., García-Sánchez M.F., Alonso J.C., Ortiz A.

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Publicada: 1 jul 2009

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Filiaciones:
Remolina A.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

Santana G.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

Ponce A.:
 Centro de Investigación en Química Aplicada, Departaento de Materiales Avanzados, Blvd Enrique Reyna Hermosillo 140., Saltillo, Coahuila, Mexico

Monroy B.M.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

García-Sánchez M.F.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

Alonso J.C.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

Ortiz A.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico