Plasma-induced size reduction in gold nanoclusters embedded in a dielectric matrix


Por: Fandino, J, Crespo A., Santana G., Rodríguez-Fernández L., Alonso J.C., García-Sánchez M.F., Ortiz A., Vigil O., Lopez-Suarez A., Oliver A.

Publicada: 1 dic 2009
Resumen:
Sandwich structures of silicon-nitride/gold/silicon-nitride with approximate thickness of 40 nm were fabricated by means of inductively-coupled remote plasma enhanced chemical vapor deposition and sputtering. In an intermediate step, nanostructure gold was subject to different surface plasma treatments, varying the plasma treatment time as well as the plasma atmosphere. The resulting structures were studied by high resolution transmission electron microscopy and Rutherford backscattering. As a consequence of plasma treatments, the gold nanoparticles mean size decreases, the particle areal distributions become narrower and the particle shapes evolve from island-like to near spherical symmetry. Oxygen plasma-etch of gold nanoparticles was observed. © 2009 American Scientific Publishers.

Filiaciones:
Crespo A.:
 Univ Nacl Autonoma Mexico, Inst Fis, Mexico City 04510, DF, Mexico

Santana G.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

Rodríguez-Fernández L.:
 Univ Nacl Autonoma Mexico, Inst Fis, Mexico City 04510, DF, Mexico

Alonso J.C.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

García-Sánchez M.F.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

Ortiz A.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

Vigil O.:
 Escuela Superior de Física y Matemáticas, IPN, Edif. 9, U.P.A.L.M., D.F., 07738, Mexico

Lopez-Suarez A.:
 Univ Nacl Autonoma Mexico, Inst Fis, Mexico City 04510, DF, Mexico

Oliver A.:
 Univ Nacl Autonoma Mexico, Inst Fis, Mexico City 04510, DF, Mexico
ISSN: 19472935
Editorial
AMER SCIENTIFIC PUBLISHERS, 26650 THE OLD RD, STE 208, VALENCIA, CA 91381-0751 USA, Estados Unidos America
Tipo de documento: Article
Volumen: 1 Número: 3
Páginas: 249-253
WOS Id: 000207804200006

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