Effect of Si addition on the structure and corrosion behavior of NbN thin films deposited by unbalanced magnetron sputtering


Por: Velasco L., Olaya J.J., Rodil S.E.

Publicada: 1 feb 2016
Resumen:
In this work, nanostructured NbxSiyNz thin films were deposited onto stainless steel AISI 304 substrates by co-sputtering a Nb target with Si additions while using unbalanced magnetron sputtering. The microstructure was analyzed by X-ray diffraction, and the chemical composition was identified by X-ray photoelectron spectroscopy. The hardness was measured by nanoindentation, and the corrosion resistance was studied by potentiodynamic polarization curves and electrochemical impedance spectroscopy using a 3 wt% NaCl solution. The addition of Si in the NbN thin films changed the microstructure from a crystalline to an amorphous phase. The chemical analysis showed the presence of both Si3N4 and NbN phases. The hardness decreased from 20 GPa (NbN) to 15 GPa for the film with the highest Si concentration (28.6 at.%). Nevertheless, the corrosion properties were significantly improved as the Si concentration increased; the polarization resistance after 168 h of immersion was two orders of magnitude larger in comparison with the substrate.

Filiaciones:
Velasco L.:
 Univ Nacl Colombia, Fac Ingn, Dept Ingn Mecan & Mecatron, Bogota 14490, Colombia

 Univ So Calif, Dept Chem Engn & Mat Sci, Los Angeles, CA 90089 USA

 Departamento de Ingeniería Mecánica y Mecatrónica, Universidad Nacional de Colombia, Bogotá, AA 14490, Colombia

 Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA 90089, United States

Olaya J.J.:
 Univ Nacl Colombia, Fac Ingn, Dept Ingn Mecan & Mecatron, Bogota 14490, Colombia

 Departamento de Ingeniería Mecánica y Mecatrónica, Universidad Nacional de Colombia, Bogotá, AA 14490, Colombia

Rodil S.E.:
 Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

 Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Mexico, D. F. 04510, Mexico
ISSN: 09478396
Editorial
Springer-Verlag, 233 SPRING STREET, NEW YORK, NY 10013 USA, Estados Unidos America
Tipo de documento: Article
Volumen: 122 Número: 2
Páginas: 1-10
WOS Id: 000369972400056

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