A detailed study of the synthesis of Bismuth thin films by PVD-methods and their structural characterization
Por:
Camps E., Rodil S.E., Salas J.A., Estrada H.V.
Publicada:
1 ene 2012
Resumen:
A comprehensive and rather complete study for the synthesis of Bismuth thin-films using physical vapor deposition (PVD) techniques aimed at identifying key features of their crystallographic structure and morphology/topography, as a function of the synthesis method is presented. These films were deposited on oxidized and non-oxidized polished silicon substrates, glass-plates and polyimide flexible films, by thermal evaporation (resistive boat and e-beam) DC- and RF-magnetron assisted sputtering, and pulsed laser (ablation) deposition (PLD). The synthesis was performed controlling the main deposition parameters of these methods. XRD-spectra conclusively indicate that the films can be preferentially oriented along the [003] or [012] Bi-structure's directions, depending on the source-to-substrate (STS)-distance, sputtering power, substrate's temperature and PLD ion's kinetic energy. It is also concluded that a relatively short STS-distance results in a rather polycrystalline structure, near independent to the used sputtering power. © 2012 Materials Research Society.
Filiaciones:
Camps E.:
Institute Nacional de Investigaciones Nucleares, Ocoyoacac, Mexico
Rodil S.E.:
Institute de Investigaciones en Materiales, UNAM, México, DF, Mexico
Salas J.A.:
Centra Nacional de Metrologia, Querétaro, QRO, 76246, Mexico
Estrada H.V.:
Centra Nacional de Metrologia, Querétaro, QRO, 76246, Mexico
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