Degradation of endosulfan by a coupled treatments in a batch reactor with three electrodes


Por: Rodriguez-Pena, M., Barrios, J. A., Becerril-Bravo, E., Rodrigo, M. A., Barrera-Diaz, C. E.

Publicada: 1 ene 2020
Resumen:
Endosulfan is one of the most important organochlorine pesticides, due is a persistence, bioaccumulation and toxicity (carcinogenic agent) is important remove this contaminant from wastewater. This work shows the results of the integrated three advanced oxidation process electrofenton/electrooxidation/ozonation (EF/EO/O3) to endosulfan degradation. Electrooxidation with Boron doped diamond (BDD) electrodes process achieved 49% of endosulfan degradation efficiency in 2 h, Ozonation process removed 62% in 2 h and electrofenton allows a 72% of endosulfan degradation efficiency. The integrated process EO/O3 improved the removal with 89% in 2 h but the EF/EO/O3 increases the removal to 92% and decreases the treatment time to only 1 h, optimizing the process with a lower energy consumption. The configuration of electrodes that improved de endosulfan degradation was iron (anode), graphite (cathode) and graphite (anode), the graphite electrodes achieved the higher H2O2 production and this is an advantage to the process, due this material is cheaper than BDD. The electrogeneration insitu of all oxidizing species allow that the process is sustainable. © 2020 Elsevier Ltd

Filiaciones:
Rodriguez-Pena, M.:
 Facultad de Química, Universidad Autonoma del Estado de México, Paseo Colon interseccion Paseo Tollocan S/N, C.P. Toluca, Estado de México 50120, Mexico

 Univ Autonoma Estado Mexico, Fac Quim, Paseo Colon intersecc Paseo Tollocan S-N, Toluca 50120, Estado de Mexic, Mexico

Barrios, J. A.:
 Instituto de Ingenieria, Universidad Nacional Autónoma de México, Edificio 5 piso 3, Cubiculo 421 Universidad Nacional Autónoma de México, C.P. 04510 Del. Coyoacán, Ciudad de México, Mexico

 Univ Nacl Autonoma Mexico, Inst Ingn, Edificio 5 Piso 3,Cubiculo 421, Ciudad De Mexico 04510, Mexico

Becerril-Bravo, E.:
 Instituto de Ingenieria, Universidad Nacional Autónoma de México, Edificio 5 piso 3, Cubiculo 421 Universidad Nacional Autónoma de México, C.P. 04510 Del. Coyoacán, Ciudad de México, Mexico

 Univ Nacl Autonoma Mexico, Inst Ingn, Edificio 5 Piso 3,Cubiculo 421, Ciudad De Mexico 04510, Mexico

Rodrigo, M. A.:
 Chemical Engineering Department, Faculty of Chemical Sciences and Technologies, University of Castilla-La Mancha, Edificio Enrique Costa Novella, Campus Universitario s/n, Ciudad Real, 13005, Spain

 Univ Castilla La Mancha, Fac Chem Sci & Technol, Chem Engn Dept, Edificio Enrique Costa Novella,Campus Univ S-N, Ciudad Real 13005, Spain

Barrera-Diaz, C. E.:
 Facultad de Química, Universidad Autonoma del Estado de México, Paseo Colon interseccion Paseo Tollocan S/N, C.P. Toluca, Estado de México 50120, Mexico

 Univ Autonoma Estado Mexico, Fac Quim, Paseo Colon intersecc Paseo Tollocan S-N, Toluca 50120, Estado de Mexic, Mexico
ISSN: 00162361
Editorial
ELSEVIER SCI LTD, THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, OXON, ENGLAND, Reino Unido
Tipo de documento: Article
Volumen: 281 Número:
Páginas:
WOS Id: 000573597100006