Possibility of intrinsic Si gap states localized at the Si-SiO2 interface


Por: Martinez E., Yndurin F.

Publicada: 1 ene 1982
Resumen:
We show that intermediate-range order at the Si surface may induce important features in the electronic structure at the Si-SiO2 interface. The electronic states at the top of the Si valence band at the Si-SiO2 interface are very sensitive to changes in the sp3 hybrid self-energy if the two dimensionality is included. We show that for a parametrized tight-binding Hamiltonian the two dimensionality of the interface can favor the existence of localized interface states in the Si gap. © 1982 The American Physical Society.

Filiaciones:
Martinez E.:
 Departmento de Fisica Fundamental, Facultad de Ciencias, Universidad Autonoma, Canto Blanco, Madrid, Spain

Yndurin F.:
 Departmento de Fisica Fundamental, Facultad de Ciencias, Universidad Autonoma, Canto Blanco, Madrid, Spain
ISSN: 01631829
Editorial
American Physical Society, ONE PHYSICS ELLIPSE, COLLEGE PK, MD 20740-3844 USA, Estados Unidos America
Tipo de documento: Article
Volumen: 25 Número: 10
Páginas: 6511-6513
WOS Id: A1982NU34600052