Surface metallic state of aluminum-nitride (AlN) thin films prepared by direct current (DC)-reactive magnetron sputtering: Optical spectroscopic analysis with incoherent light
Por:
Rakov N., Mahmood A., Xiao M.
Publicada:
1 ene 2004
Resumen:
Work is reported on optical spectroscopy of aluminum-nitride (AlN) thin films. The films were prepared by DC-reactive magnetron sputtering with various deposition parameters. Reflection of the films was measured with an incoherent light source. Analysis on the spectrum of the reflection demonstrates that with certain deposition conditions the films become metallic at the surface, i.e. the periodic and slowly changing reflection spectrum that would be associated with dielectric or ceramic thin films is replaced by a spectrum without periodic feature and with two strongly enhanced bands, respectively at about 380 and 550 nm, which are some typic spectral features for metallic materials. © 2003 Acta Materialia Inc. Published by elsevier Ltd. All rights reserved.
Filiaciones:
Rakov N.:
Ctro. de Cie. de la Mat. Condensada, Univ. Nac. Auton. de Mex., Apartado Postal 2681, CP 22800 Ensenada, Baja California, Mexico
Mahmood A.:
Ctro. de Cie. de la Mat. Condensada, Univ. Nac. Auton. de Mex., Apartado Postal 2681, CP 22800 Ensenada, Baja California, Mexico
Xiao M.:
Ctro. de Cie. de la Mat. Condensada, Univ. Nac. Auton. de Mex., Apartado Postal 2681, CP 22800 Ensenada, Baja California, Mexico
Department of Optics, CCMC-UNAM, P.O. Box 439036, San Ysidro, CA 9214, United States
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